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AES
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Auger Electron Spectroscopy
An analytical technique used to find an element's component and formation by measuring the Auger electrons emitted from the sample when several tens of eV of electron beams are fired onto its surface.
Analysis Equipment
LCD Panel Color Filter – Cs Analysis example
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AFM/SSRM/KPFM
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AFM (Atomic Force Microscopy)
A technique used to analyze surface topography and roughness at the nanometer scale by detecting the interaction forces between a cantilever tip and the atoms on the sample surface.
SSRM (Scanning Spreading Resistance Microscopy)
An analysis method that uses a conductive probe tip to map the local resistance distribution and carrier concentration inside semiconductor devices in two dimensions.
KPFM (Kelvin Probe Force Microscopy)
A technique that measures the contact potential difference (CPD) between the probe tip and the sample to determine the surface work function and potential distribution.
Analysis Equipment
AFM Analysis Case
Case Study: Cs Shape Analysis of LCD Panel Color Filter
SSRM Analysis Case
Doping Profile Characterization of Si IGBT
KPFM Analysis Case
Potential Distribution Analysis
The potential distribution was measured using KPFM.
Damaged hair exhibited a negative charge distribution, while after treatment the surface charge shifted to a positive distribution.
This change confirms the effect of the treatment on the surface potential characteristics.
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ASTAR
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ASTAR
Crystal azimuth phase mapping analytic method using TEM
Related Equipments
TEM EBSD(ASTAR) Analysis example
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Ion Milling
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Single-sided grinder
Cross-section Polisher or Ion Milling
Pre-treatment Analysis Method that uses Ar ion beams to process the cross-section of samples
Related Equipments
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CP use case
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D-SIMS
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Dynamic Secondary Ion Mass Spectroscopy
An trace ingredients analysis method to find height and depth by detecting the mass of secondary ions.
Related Equipments
NPN Junction Concentration Distribution Analysis
Blue LED Dopant Distribution Analysis
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EBSD
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Electron Backscattered Diffraction
An analysis of single-side/multilayer thin film thickness and refractive index using polarising characteristics of light
Related Equipments
Plated Cu Film surface EBSD Analysis case
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TOF-SIMS
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Time of Flight – Secondary Ion Mass Analyzer
Time of Flight SIMS
Analysis of trace components based on the different arrival times depending on the mass of the secondary ion/ion group
Related Equipments
BGA Surface Decoloration Analysis
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Nano-SIMS
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Nano – Secondary Ion Mass Analyzer
Trace element analysis method to detect the mass of secondary ions by focusing the primary ion beam below 50nm.
Related Equipments
Structural Analysis of Cathode Active Material in Lithium Secondary Battery
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XPS
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X-ray Photoelectron Spectroscopy
An analytic method to identify the chemical properties of the surface of a substances by analysing the kinetic energy of electrons emitted from the solid surface when it is radiated by the x-ray.
Related Equipments
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Inner Film in-layer analysis case
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XRD
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X-ray Diffraction
A quantitative analysis of crystalline structure and compounds by using the characteristics of diffraction that satisfies Bragg's law when crystalline x-ray is radiated onto the sample.
Related Equipments
Analysis of Direction of Thin Film Poly Si Crystalline
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XRR
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X-ray Reflectometry
Surface and interface analysis using the full external reflection effect of x-rays
Related Equipments
ALD Deposition TiN Thin Film Density Analysis
Contact Point
Person in charge- • TEL.
- +82-31-546-7553
- • E-mail.
- qrtma@qrtkr.com